SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

The present disclosure provides semiconductor devices including a bit line. In some embodiments, a semiconductor device includes a substrate including a plurality of active regions defined by device isolation layers, a plurality of bit lines extending in a first horizontal direction on the substrate, a bit line contact between a first active region of the plurality of active regions and a first bit line of the plurality of bit lines on the first active region, and an active pad on a second active region of the plurality of active regions adjacent to the first active region. The bit line contact includes a first contact layer and a second contact layer on the first contact layer. The active pad is disposed to face the bit line contact.