PATTERNED LOW MELTING GLASS (LMG) PHOTONIC FILM SURFACES BY WET-ETCH PHOTOLITHOGRAPHY

A glass article comprises a film layer deposited on a glass substrate. The film layer has a melting point less than 450°C and comprises a thickness and a primary surface. The primary surface defines at least one elevated surface protruding relative to the at least one relief surface. The elevated su...

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Hauptverfasser: NELSON, Cameron Robert, WOOD, William Allen, DABICH, II, Leonard Charles, HARDING, Traci Nanette, QUESADA, Mark Alejandro, ZHU, Bin
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creator NELSON, Cameron Robert
WOOD, William Allen
DABICH, II, Leonard Charles
HARDING, Traci Nanette
QUESADA, Mark Alejandro
ZHU, Bin
description A glass article comprises a film layer deposited on a glass substrate. The film layer has a melting point less than 450°C and comprises a thickness and a primary surface. The primary surface defines at least one elevated surface protruding relative to the at least one relief surface. The elevated surface forms a periodic pattern defined by an etch mask, and the relief surface is defined as an inverse pattern of the etch mask. The duration of an etching process applied to the film layer defines a ratio of a first area of the elevated surface to a second area of the relief surface.
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language eng ; fre ; ger
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subjects CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS
CHEMISTRY
GLASS
JOINING GLASS TO GLASS OR OTHER MATERIALS
METALLURGY
MINERAL OR SLAG WOOL
SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS
SURFACE TREATMENT OF GLASS
title PATTERNED LOW MELTING GLASS (LMG) PHOTONIC FILM SURFACES BY WET-ETCH PHOTOLITHOGRAPHY
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