PATTERNED LOW MELTING GLASS (LMG) PHOTONIC FILM SURFACES BY WET-ETCH PHOTOLITHOGRAPHY
A glass article comprises a film layer deposited on a glass substrate. The film layer has a melting point less than 450°C and comprises a thickness and a primary surface. The primary surface defines at least one elevated surface protruding relative to the at least one relief surface. The elevated su...
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creator | NELSON, Cameron Robert WOOD, William Allen DABICH, II, Leonard Charles HARDING, Traci Nanette QUESADA, Mark Alejandro ZHU, Bin |
description | A glass article comprises a film layer deposited on a glass substrate. The film layer has a melting point less than 450°C and comprises a thickness and a primary surface. The primary surface defines at least one elevated surface protruding relative to the at least one relief surface. The elevated surface forms a periodic pattern defined by an etch mask, and the relief surface is defined as an inverse pattern of the etch mask. The duration of an etching process applied to the film layer defines a ratio of a first area of the elevated surface to a second area of the relief surface. |
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The film layer has a melting point less than 450°C and comprises a thickness and a primary surface. The primary surface defines at least one elevated surface protruding relative to the at least one relief surface. The elevated surface forms a periodic pattern defined by an etch mask, and the relief surface is defined as an inverse pattern of the etch mask. 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language | eng ; fre ; ger |
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subjects | CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMISTRY GLASS JOINING GLASS TO GLASS OR OTHER MATERIALS METALLURGY MINERAL OR SLAG WOOL SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS |
title | PATTERNED LOW MELTING GLASS (LMG) PHOTONIC FILM SURFACES BY WET-ETCH PHOTOLITHOGRAPHY |
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