PATTERNED LOW MELTING GLASS (LMG) PHOTONIC FILM SURFACES BY WET-ETCH PHOTOLITHOGRAPHY

A glass article comprises a film layer deposited on a glass substrate. The film layer has a melting point less than 450°C and comprises a thickness and a primary surface. The primary surface defines at least one elevated surface protruding relative to the at least one relief surface. The elevated su...

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Bibliographische Detailangaben
Hauptverfasser:	NELSON, Cameron Robert, WOOD, William Allen, DABICH, II, Leonard Charles, HARDING, Traci Nanette, QUESADA, Mark Alejandro, ZHU, Bin
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMISTRY GLASS JOINING GLASS TO GLASS OR OTHER MATERIALS METALLURGY MINERAL OR SLAG WOOL SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS
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Beschreibung
Zusammenfassung:	A glass article comprises a film layer deposited on a glass substrate. The film layer has a melting point less than 450°C and comprises a thickness and a primary surface. The primary surface defines at least one elevated surface protruding relative to the at least one relief surface. The elevated surface forms a periodic pattern defined by an etch mask, and the relief surface is defined as an inverse pattern of the etch mask. The duration of an etching process applied to the film layer defines a ratio of a first area of the elevated surface to a second area of the relief surface.