ELECTROSTATIC CHUCK THAT INCLUDES UPPER CERAMIC LAYER THAT INCLUDES A DIELECTRIC LAYER, AND RELATED METHODS AND STRUCTURES

Described are electrostatic chuck devices that are useful to support a workpiece while processing the workpiece, upper ceramic layer components of electrostatic chuck assemblies, the upper ceramic layer having a deposited dielectric layer, a relatively smooth finish, or both, and related methods.

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Bibliographische Detailangaben
Hauptverfasser: LIU, Yan, DONNELL, Steven, RYBCZYNSKI, Jakub, MINSKY, Caleb
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:Described are electrostatic chuck devices that are useful to support a workpiece while processing the workpiece, upper ceramic layer components of electrostatic chuck assemblies, the upper ceramic layer having a deposited dielectric layer, a relatively smooth finish, or both, and related methods.