ELECTROSTATIC CHUCK THAT INCLUDES UPPER CERAMIC LAYER THAT INCLUDES A DIELECTRIC LAYER, AND RELATED METHODS AND STRUCTURES
Described are electrostatic chuck devices that are useful to support a workpiece while processing the workpiece, upper ceramic layer components of electrostatic chuck assemblies, the upper ceramic layer having a deposited dielectric layer, a relatively smooth finish, or both, and related methods.
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Format: | Patent |
Sprache: | eng ; fre ; ger |
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Zusammenfassung: | Described are electrostatic chuck devices that are useful to support a workpiece while processing the workpiece, upper ceramic layer components of electrostatic chuck assemblies, the upper ceramic layer having a deposited dielectric layer, a relatively smooth finish, or both, and related methods. |
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