GRAY-TONE RESISTS AND PROCESSES

Disclosed herein are techniques for fabricating a straight or slanted surface-relief grating with a uniform or non-uniform grating depth. According to certain embodiments, a gray-tone photoresist includes a novolac resin, a diazonaphthoquinone (DNQ) dissolution inhibitor, and one or more crosslinkin...

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Bibliographische Detailangaben
Hauptverfasser:	DUNDAR ARISOY, Feyza, SPORRE, John, ZHANG, Xu, KAITZ, Joshua Andrew, FRANKE, Elliott, ZHANG, Keren, VORA, Ankit
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CALCULATING CINEMATOGRAPHY COMPUTING COUNTING ELECTRIC DIGITAL DATA PROCESSING ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	Disclosed herein are techniques for fabricating a straight or slanted surface-relief grating with a uniform or non-uniform grating depth. According to certain embodiments, a gray-tone photoresist includes a novolac resin, a diazonaphthoquinone (DNQ) dissolution inhibitor, and one or more crosslinking agents for crosslinking the novolac resin at an elevated temperature to increase a glass transition temperature of the gray-tone photoresist and/or lower an etch rate of the gray-tone photoresist. After gray-tone photo exposure and development, the gray-tone photoresist is baked at the elevated temperature to crosslink. The crosslinked gray-tone photoresist has a higher density and a higher glass transition temperature, and thus would not become flowable to cause ripples or other surface roughness during the etching.