SEMICONDUCTOR DIE AND METHOD OF MANUFACTURING THE SAME

The disclosure relates to a semiconductor die (1) comprising a vertical transistor device (10) having a gate electrode (11) in a gate trench (12), and a MOS gated diode MGD (20) having an MGD gate electrode (21) in an MGD trench (22), wherein the gate trench (12) of the transistor device (10) has an...

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Bibliographische Detailangaben
Hauptverfasser: FEIL, Thomas Martin, MARAK, Arnold, WUTTE, Britta
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:The disclosure relates to a semiconductor die (1) comprising a vertical transistor device (10) having a gate electrode (11) in a gate trench (12), and a MOS gated diode MGD (20) having an MGD gate electrode (21) in an MGD trench (22), wherein the gate trench (12) of the transistor device (10) has an elongated extension in a first lateral direction (31), and wherein the transistor device (10) and the MOS gated diode (20) are arranged consecutive in the first lateral direction (31).