COMPOSITIONS FOR REMOVING PHOTORESIST AND ETCH RESIDUE FROM A SUBSTRATE WITH COPPER CORROSION INHIBITOR AND USES THEREOF

COMPOSITIONS FOR REMOVING PHOTORESIST AND ETCH RESIDUE FROM A SUBSTRATE WITH COPPER CORROSION INHIBITOR AND USES THEREOF

The disclosed and claimed compositions relate to stripper solutions for the removal of photoresists and etch residue that include a triazine (e.g., benzoguanamine) corrosion inhibitor.

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Bibliographische Detailangaben
Hauptverfasser: WU, Aiping, SUN, Laisheng, WANG, Lili, CAO, Yuanmei
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Beschreibung
Zusammenfassung:The disclosed and claimed compositions relate to stripper solutions for the removal of photoresists and etch residue that include a triazine (e.g., benzoguanamine) corrosion inhibitor.