EUV MULTI-MIRROR ARRANGEMENT

An EUV multi-mirror arrangement (MMA) comprises a multiplicity of mirror units (MU), which are arranged one next to the other in a grid arrangement on a carrier structure (TS), wherein each mirror unit has a base element (BE) and, opposite the base element (BE), an individually tiltable mirror element (ME) which has a mirror substrate (SUB) that carries on a front face facing away from the base element a reflection coating (REF) for forming a mirror surface (MS) that reflects EUV radiation. In each mirror unit (MU), components of a suspension system (SUS) for movably mounting the mirror element (ME) on the base element (BE), actuators of an actuator system (AKS) for producing movements of the mirror element (ME) in relation to the base element (BE) as a reaction to the reception of control signals, and sensors of a sensor system (SENS) for capturing the position of the mirror elements (ME) are arranged between the base element (BE) and the mirror element (ME). The actuator system (AKS) has piezoelectric actuators (AKT). The sensor system (SENS) has capacitive sensors (KPS).