CHAMBER FOR A PROJECTION SYSTEM OF A LITHOGRAPHIC APPARATUS, PROJECTION SYSTEM AND LITHOGRAPHIC APPARATUS

A chamber for a projection system of a lithographic apparatus is described, the chamber comprising:- an opening configured to enable, during use, a patterned radiation beam to be projected onto a substrate that is arranged outside the chamber;- a conduit having an outlet in the aperture, the conduit...

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Bibliographische Detailangaben
Hauptverfasser:	JANSSEN, Franciscus, Johannes, Joseph, ARLEMARK, Erik, Johan, GRZELKA, Jacek
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A chamber for a projection system of a lithographic apparatus is described, the chamber comprising:- an opening configured to enable, during use, a patterned radiation beam to be projected onto a substrate that is arranged outside the chamber;- a conduit having an outlet in the aperture, the conduit being configured to deliver a gas to the opening for providing a gas seal of the opening;- a filter arranged in a flow path of the gas, at or near the outlet, the filter being configured to thermally condition the gas.