ELECTRO-ETCHING METHOD FOR AN AREA-SELECTIVE TREATMENT OF A SUBSTRATE

ELECTRO-ETCHING METHOD FOR AN AREA-SELECTIVE TREATMENT OF A SUBSTRATE

The application relates to an electro-etching method for an area-selective treatment of a substrate and an electro-etching system for an area-selective treatment of a substrate.The electro-etching method for an area-selective treatment of a substrate comprises:providing a substrate comprising a surf...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: KOLITSCH-MATALN, Marianne, REICHENPFADER, Manuel, OKORN-SCHMIDT, Harald, PÖCHEIM, Alexander, ÖTZLINGER, Herbert
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
APPARATUS THEREFOR
BASIC ELECTRIC ELEMENTS
CHEMISTRY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES
METALLURGY
PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROMOBJECTS
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:The application relates to an electro-etching method for an area-selective treatment of a substrate and an electro-etching system for an area-selective treatment of a substrate.The electro-etching method for an area-selective treatment of a substrate comprises:providing a substrate comprising a surface at least partially covered by at least one electrically conductive material and structures at least partially formed by the electrically conductive material, so that the structures are electrically connected by means of the electrically conductive material covering the surface,covering the substrate with an electrolyte,applying an electric potential to the substrate,electro-etching the electrically conductive material by means of a combination of the electric potential and the electrolyte, andcontinuing the electro-etching until the electrically conductive material at the surface is removed so that the structures are no longer electrically connected by means of the electrically conductive material covering the surface.