FOCUS METROLOGY METHOD AND ASSOCIATED METROLOGY DEVICE

Disclosed is a method of determining at least one exposure parameter such as focus and/or dose. The method comprises obtaining product metrology data for a plurality of structures; grouping said product metrology data into a plurality of neighbor groups, each neighbor group describing a different ar...

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Bibliographische Detailangaben
Hauptverfasser:	CALADO, Victor Emanuel, THISSEN, Nick Franciscus Wilhelmus, VAN LEEST, Adriaan Johan, MATHIJSSEN, Simon Gijsbert Josephus
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	Disclosed is a method of determining at least one exposure parameter such as focus and/or dose. The method comprises obtaining product metrology data for a plurality of structures; grouping said product metrology data into a plurality of neighbor groups, each neighbor group describing a different arrangement of said structures; obtaining pre-calibrated sensitivity relationship data for each of said plurality of neighbor groups or different combinations thereof, and inferring said at least one exposure parameter from the product metrology data and pre-calibrated sensitivity relationship data.