ELECTRON BEAM MONITORING DEVICE AND ELECTRON BEAM IRRADIATION SYSTEM

ELECTRON BEAM MONITORING DEVICE AND ELECTRON BEAM IRRADIATION SYSTEM

An electron beam monitoring device monitors an electron beam in an electron beam irradiation system having an electron beam irradiation device configured to irradiate an irradiation target object with the electron beam via an emission window. The electron beam monitoring device includes a first X-ra...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser: MATSUI, Shinjiro
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
GAMMA RAY OR X-RAY MICROSCOPES
IRRADIATION DEVICES
NUCLEAR ENGINEERING
NUCLEAR PHYSICS
PHYSICS
TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR
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Beschreibung
Zusammenfassung:An electron beam monitoring device monitors an electron beam in an electron beam irradiation system having an electron beam irradiation device configured to irradiate an irradiation target object with the electron beam via an emission window. The electron beam monitoring device includes a first X-ray detection unit and a second X-ray detection unit. The first X-ray detection unit has a detection surface directed toward between the emission window and the irradiation target object and detects an X-ray. The second X-ray detection unit is arranged to face the emission window and detects a one-dimensional or two-dimensional distribution of the X-ray.