LITHOGRAPHIC SYSTEM AND METHOD

A lithographic system comprising a radiation source (SO) comprising a drive laser configured to generate drive laser radiation for irradiating a fuel and thereby generating extreme ultraviolet radiation. The lithographic system comprises a lithographic apparatus (LA) configured to receive extreme ul...

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Bibliographische Detailangaben
Hauptverfasser:	VAN DRENT, William, Peter, BECKERS, Jasper, Pierre, TE SLIGTE, Edwin, HARRISON, Kramer, Daniel, VAN DE WIEL, Hubertus, Johannes
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A lithographic system comprising a radiation source (SO) comprising a drive laser configured to generate drive laser radiation for irradiating a fuel and thereby generating extreme ultraviolet radiation. The lithographic system comprises a lithographic apparatus (LA) configured to receive extreme ultraviolet radiation directed through an optical aperture (8) located between the radiation source and the lithographic apparatus. The lithographic apparatus comprises a radiation shield (100) configured to block at least a portion (2a) of the drive laser radiation that propagates through the optical aperture.[Fig. 2]