CHLOROPRENE-BASED POLYMER LATEX COMPOSITION, AND DIP-MOLDED ARTICLE

The present invention provides a chloroprene-based polymer latex composition, which has a low residual amount of mercaptans with hygiene concerns remaining, and which can obtain a chloroprene-based polymer dip-molded article having excellent flexibility and high breaking strength even with use of le...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	KUMAGAI, Yushi, ITO, Misaki, KATO, Masahiro
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	CHEMISTRY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS
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Beschreibung
Zusammenfassung:	The present invention provides a chloroprene-based polymer latex composition, which has a low residual amount of mercaptans with hygiene concerns remaining, and which can obtain a chloroprene-based polymer dip-molded article having excellent flexibility and high breaking strength even with use of less vulcanization accelerator and sulfur, due to the plasticizing effect of a low molecular weight polymer and the use of a heteroaromatic ring-based compound.According to the present invention, there is provided a chloroprene-based polymer latex composition including a chloroprene-based polymer latex, a metal oxide, and a heteroaromatic ring-based compound, wherein the chloroprene-based polymer latex composition includes 0.5 to 15.0 parts by mass of the metal oxide and 0.1 to 10.0 parts by mass of the heteroaromatic ring-based compound per 100 parts by mass of solid content of the chloroprene-based polymer latex, the chloroprene-based polymer latex composition has a content of alkyl mercaptan compounds of 0.34 parts by mass or less per 100 parts by mass of solid content of the chloroprene-based polymer latex, and the heteroaromatic ring-based compound is represented by chemical formula (1).