LITHOGRAPHIC APPARATUS THERMAL CONDITIONING SYSTEM AND METHOD

A thermal conditioning system is configured to thermally condition an object. The thermal conditioning system comprises a fluid duct configured to be connected to the object and configured to provide a flow of a thermal conditioning fluid to the object The fluid duct comprises a supply duct configur...

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Bibliographische Detailangaben
Hauptverfasser:	VAN DE MEERENDONK, Remco, DE LAAT, Kim, Johanna, Mechelina, JANSSEN, Gerardus, Arnoldus, Hendricus, Franciscus, SCHIMMEL, Hendrikus, Gijsbertus, ARORA, Sampann, WIJCKMANS, Maurice, Willem, Jozef, Etiënne, VAN GIESSEN, Cornelis, WU, Long, PEKELDER, Sven, SWINKELS, Milo, Yaro, KRABBEN, Ingmar, Gerrit, Willem, FEIJTS, Maurice, Wilhelmus, Leonardus, Hendricus, VERVOORDELDONK, Michael, Johannes
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A thermal conditioning system is configured to thermally condition an object. The thermal conditioning system comprises a fluid duct configured to be connected to the object and configured to provide a flow of a thermal conditioning fluid to the object The fluid duct comprises a supply duct configured to be connected to the object and to supply the thermal conditioning fluid to the object and a discharging duct configured to be connected to the object and to discharge the thermal conditioning fluid from the object. The supply duct and the discharging duct are each provided with at least two silencers arranged in series along the supply duct and along the discharging duct respectively.