PELLICLE FILM, PELLICLE, EXPOSURE ORIGINAL PLATE WITH PELLICLE, EXPOSURE METHOD, SEMICONDUCTOR MANUFACTURING METHOD, AND LIQUID CRYSTAL DISPLAY PANEL MANUFACTURING METHOD

The present invention provides: a pellicle film including a film (BNNT film) having boron nitride nanotubes; and a pellicle for photolithography including a pellicle film and a pellicle frame, wherein the pellicle film is provided on one end surface of the pellicle frame via an adhesive, and the pel...

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Hauptverfasser: NISHIMURA, Akinori, SHIRASAKI, Toru
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creator NISHIMURA, Akinori
SHIRASAKI, Toru
description The present invention provides: a pellicle film including a film (BNNT film) having boron nitride nanotubes; and a pellicle for photolithography including a pellicle film and a pellicle frame, wherein the pellicle film is provided on one end surface of the pellicle frame via an adhesive, and the pellicle film includes a BNNT film. According to the present invention, it is possible to provide: a pellicle film which has a high permeation for EUV exposure, has excellent heat resistance and durability, and has hydrogen radical resistance; and a pellicle provided with the same.
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subjects APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
title PELLICLE FILM, PELLICLE, EXPOSURE ORIGINAL PLATE WITH PELLICLE, EXPOSURE METHOD, SEMICONDUCTOR MANUFACTURING METHOD, AND LIQUID CRYSTAL DISPLAY PANEL MANUFACTURING METHOD
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