PELLICLE FILM, PELLICLE, EXPOSURE ORIGINAL PLATE WITH PELLICLE, EXPOSURE METHOD, SEMICONDUCTOR MANUFACTURING METHOD, AND LIQUID CRYSTAL DISPLAY PANEL MANUFACTURING METHOD

The present invention provides: a pellicle film including a film (BNNT film) having boron nitride nanotubes; and a pellicle for photolithography including a pellicle film and a pellicle frame, wherein the pellicle film is provided on one end surface of the pellicle frame via an adhesive, and the pel...

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Bibliographische Detailangaben
Hauptverfasser:	NISHIMURA, Akinori, SHIRASAKI, Toru
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The present invention provides: a pellicle film including a film (BNNT film) having boron nitride nanotubes; and a pellicle for photolithography including a pellicle film and a pellicle frame, wherein the pellicle film is provided on one end surface of the pellicle frame via an adhesive, and the pellicle film includes a BNNT film. According to the present invention, it is possible to provide: a pellicle film which has a high permeation for EUV exposure, has excellent heat resistance and durability, and has hydrogen radical resistance; and a pellicle provided with the same.