PART COATED WITH A CARBON-BASED LAYER

The invention relates to a method for depositing a carbon-based material from a target onto a metal substrate, by ion-assisted cathode sputtering.According to the invention, the ratio between the flow of ions that is directed toward the substrate and the flow of neutral carbon atoms that is directed...

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Bibliographische Detailangaben
Hauptverfasser:	OUGIER, Michaël, LEROY, Marie- Alix
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSIONOF CHEMICAL INTO ELECTRICAL ENERGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The invention relates to a method for depositing a carbon-based material from a target onto a metal substrate, by ion-assisted cathode sputtering.According to the invention, the ratio between the flow of ions that is directed toward the substrate and the flow of neutral carbon atoms that is directed toward the substrate is adjusted to between 1.7 and 3.5; and a bias voltage of between −35 V and −100 V is applied to the substrate.