CHARGED PARTICLE ASSESSMENT METHOD AND SYSTEM

CHARGED PARTICLE ASSESSMENT METHOD AND SYSTEM

A charged particle assessment method for identifying candidate defects in samples by scanning a charged particle beam across a sample; the method comprising:obtaining a first reference image from a first region of the sample and a second reference image from a second region of the sample using a cha...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: DAVE, Dhara, KUIPER, Vincent, Sylvester
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
BASIC ELECTRIC ELEMENTS
CALCULATING
COMPUTING
COUNTING
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
PHYSICS
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Beschreibung
Zusammenfassung:A charged particle assessment method for identifying candidate defects in samples by scanning a charged particle beam across a sample; the method comprising:obtaining a first reference image from a first region of the sample and a second reference image from a second region of the sample using a charged particle assessment apparatus;obtaining a sample image from a third region of the sample using the charged particle assessment apparatus; andcomparing the sample image to the first reference image and to the second reference image to identify any candidate defects in the third region;wherein the first reference image and/or the second reference image are obtained with a higher fidelity than the sample image.