ARC EVAPORATION SOURCE

An arc evaporation source includes a target including a target discharge surface, an arc power supply, an electromagnetic coil arranged forward of the target, and a central magnet arranged rearward of the target. The electromagnetic coil forms a first magnetic field containing a first magnetic force...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	FUJITA, Junki, KUJIME, Susumu, YAMAMOTO, Kenji, TAKAHASHI, Tetsuya
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	An arc evaporation source includes a target including a target discharge surface, an arc power supply, an electromagnetic coil arranged forward of the target, and a central magnet arranged rearward of the target. The electromagnetic coil forms a first magnetic field containing a first magnetic force line intersecting the target discharge surface and extending so as to pass through, in a front-rear direction, radially inside the electromagnetic coil. The central magnet forms a second magnetic field containing a second magnetic force line extending in a front-rear direction in a region between the central magnet and the target discharge surface. Repulsion between the first magnetic field and the second magnetic field stably forms a horizontal magnetic field and a vertical magnetic field on the target discharge surface.