SEMICONDUCTOR-SUPERCONDUCTOR HYBRID DEVICE AND ITS FABRICATION

A method of etching a workpiece comprising a lead component (24) is provided. The method comprises forming (301) a mask on the lead component (24), the mask defining exposed regions of the lead component (24); and contacting (302) the exposed regions with an etchant composition. The etchant composit...

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Bibliographische Detailangaben
Hauptverfasser: MANFRA, Michael James, MARCUS, Charles Masamed, GARDNER, Geoffrey Charles, DRACHMANN, Asbjørn Cennet Cliff
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:A method of etching a workpiece comprising a lead component (24) is provided. The method comprises forming (301) a mask on the lead component (24), the mask defining exposed regions of the lead component (24); and contacting (302) the exposed regions with an etchant composition. The etchant composition comprises acetic acid and propan-2-ol.