SEMICONDUCTOR-SUPERCONDUCTOR HYBRID DEVICE AND ITS FABRICATION
A method of etching a workpiece comprising a lead component (24) is provided. The method comprises forming (301) a mask on the lead component (24), the mask defining exposed regions of the lead component (24); and contacting (302) the exposed regions with an etchant composition. The etchant composit...
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Format: | Patent |
Sprache: | eng ; fre ; ger |
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Zusammenfassung: | A method of etching a workpiece comprising a lead component (24) is provided. The method comprises forming (301) a mask on the lead component (24), the mask defining exposed regions of the lead component (24); and contacting (302) the exposed regions with an etchant composition. The etchant composition comprises acetic acid and propan-2-ol. |
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