METHOD FOR PATTERNING A MASK, METHOD FOR PRODUCING AN INSERT OR A MOLD, AND OPTICAL ARTICLE WITH SURFACE MICROSTRUCTURES

METHOD FOR PATTERNING A MASK, METHOD FOR PRODUCING AN INSERT OR A MOLD, AND OPTICAL ARTICLE WITH SURFACE MICROSTRUCTURES

The disclosure relates to a method for preparing an object having a curved surface to be etched, the resulting etched surface being useable as a mold for manufacturing an optical article. The method comprises illuminating the curved surface of the object through a patterned mask placed over or on th...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser: CHIU, Hao-Wen
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PERFORMING OPERATIONS
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCESIN A PLASTIC STATE
TRANSPORTING
WORKING OF PLASTICS
WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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Beschreibung
Zusammenfassung:The disclosure relates to a method for preparing an object having a curved surface to be etched, the resulting etched surface being useable as a mold for manufacturing an optical article. The method comprises illuminating the curved surface of the object through a patterned mask placed over or on the curved surface. The patterned mask comprises a curved surface that is configured to conform to the curved surface of the object. The curved surface of the patterned mask comprises at least one micrometer-sized area that differs in transmission function from an adjacent area. The curved surface is made of a material which, when thusly illuminated, undergoes local changes in a chemical resistance to a developer.The disclosure further relates to a method for patterning a mask having a curved surface and to an optical article having a curved surface comprising microstructures that are uniformly normal to the curved surface.