METHOD FOR CONTROLLING THE TEMPERATURE IN A PROCESSING APPARATUS

The invention relates to a method of closed-loop control of the temperature in a chemical engineering apparatus (101, 201, 301, 401), in which, in a primary circuit (102, 202, 302, 402), a liquid is conveyed out of the apparatus (101, 201, 301, 401), fed at least partly to a heat transferer (103, 203, 303, 403) and recycled at least partly back to the apparatus (101, 201, 301, 401), where the heat transferer (103, 203, 303, 403) is cooled or heated by a heat transfer medium in a secondary circuit (104, 204, 304, 404), comprising the steps of:providing a target value for the temperature of the liquid in the apparatus (101, 201, 301, 401),detecting an actual value for the temperature of the liquid in the apparatus (101, 201, 301, 401) andcalculating the temperature difference between the actual value and the target value of the liquid in the apparatus (101, 201, 301, 401).According to the invention,a heat flow taken from or added to the liquid in the primary circuit (102, 202, 302, 402) by the heat transferer (103, 203, 303, 403) is ascertained,a control signal is calculated on the basis of a defined closed-loop control algorithm, where the closed-loop control algorithm is configured such that the control signal is dependent on the heat flow and the temperature difference between the actual value and the target value of the liquid in the apparatus (101, 201, 301, 401), andthe flow rate of the stream of liquid through the heat transferer (103, 203, 303, 403) in the primary circuit (102, 202, 302, 402) and/or a flow rate of the heat transfer medium through the heat transferer in the secondary circuit (104, 204, 304, 404) is/are manipulated on the basis of the control signal.