ONE-STEP PRETREATMENT METHOD OF METALLIC SUBSTRATES AT NON-NEUTRAL PH VALUES FOR METAL COLD FORMING

Disclosed herein is a method of pretreatment of a metallic substrate for a subsequent metal cold forming process. The method includes at least steps (1) and (2), namely providing at least one substrate having at least one surface at least partially made of at least one metal (step (1)), contacting t...

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Bibliographische Detailangaben
Hauptverfasser:	ORBEN, Martin, SHI, Yinfeng
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL FUELS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LUBRICANTS LUBRICATING COMPOSITIONS METALLURGY PEAT PETROLEUM, GAS OR COKE INDUSTRIES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TECHNICAL GASES CONTAINING CARBON MONOXIDE USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATINGINGREDIENTS IN A LUBRICATING COMPOSITION
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Beschreibung
Zusammenfassung:	Disclosed herein is a method of pretreatment of a metallic substrate for a subsequent metal cold forming process. The method includes at least steps (1) and (2), namely providing at least one substrate having at least one surface at least partially made of at least one metal (step (1)), contacting the at least one surface of the substrate provided in step (1) with an aqueous lubricant composition (B) (step (2)), where the aqueous lubricant composition (B) includes besides water at least constituents (b1) to (b4) and optionally (b5).Further disclosed herein are a pretreated metallic substrate obtained by the method, a method of cold forming of a metallic substrate, and an aqueous lubricant composition (B).