LAMINATED FILM STRUCTURE AND METHOD FOR MANUFACTURING LAMINATED FILM STRUCTURE

Conventional methods for forming a metal film by plating after forming an oxide layer on a to-be-treated object exhibit poor metal film adhesion and allow such a metal film to be formed on a flat to-be-treated surface, but it is not easy to form such a metal film on the inner wall surface of through...

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Hauptverfasser: SHIMADA, Kazuya, SAKATA, Toshihiko, HAYAMIZU, Masahito, CHAKUNO, Makoto
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:Conventional methods for forming a metal film by plating after forming an oxide layer on a to-be-treated object exhibit poor metal film adhesion and allow such a metal film to be formed on a flat to-be-treated surface, but it is not easy to form such a metal film on the inner wall surface of through holes.A metal film, produced by a method for forming a metal film including a first film forming step of forming an oxide layer on a to-be-treated surface of a to-be-treated object by bringing the to-be-treated surface into contact with a reaction solution containing fluorine and an oxide precursor, a fluorine removal step of removing fluorine in the oxide layer, a catalyst supporting step of supporting a catalyst on the oxide layer by bringing the oxide layer into contact with a catalyst solution, and a second film forming step of depositing a metal film on the oxide layer by bringing the oxide layer into contact with an electroless plating liquid, has improved adhesion and can be formed also on the inner wall of through holes.