GAS FILLING DEVICE

A gas filling device (1) is provided with a first gas supply pipeline (7), a second gas supply pipeline (8), and an integrated control panel (9). The first gas supply pipeline (7) supplies hydrogen gas from a multistage accumulator (2) to a first filled tank (53) mounted on a first vehicle (51). The...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: REMBUTSU, Tatsuya, OSHIMA, Shinji
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:A gas filling device (1) is provided with a first gas supply pipeline (7), a second gas supply pipeline (8), and an integrated control panel (9). The first gas supply pipeline (7) supplies hydrogen gas from a multistage accumulator (2) to a first filled tank (53) mounted on a first vehicle (51). The second gas supply pipeline (8) supplies hydrogen gas from the multistage accumulator (2) to a second filled tank (54) mounted on a second vehicle (52) different from the first vehicle (51). At the time of filling the hydrogen gas into both of the first filled tank (53) and the second filled tank (54) from the multistage accumulator (2), the integrated control panel (9) sets a pressure rise rate of the first filled tank (53) or a pressure rise rate of the second filled tank (54) to be lower than a reference pressure rise rate in accordance with a difference in pressure between the first filled tank (53) and the second filled tank (54).