GAS FILLING DEVICE
A gas filling device (1) is provided with a first gas supply pipeline (7), a second gas supply pipeline (8), and an integrated control panel (9). The first gas supply pipeline (7) supplies hydrogen gas from a multistage accumulator (2) to a first filled tank (53) mounted on a first vehicle (51). The...
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Format: | Patent |
Sprache: | eng ; fre ; ger |
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Zusammenfassung: | A gas filling device (1) is provided with a first gas supply pipeline (7), a second gas supply pipeline (8), and an integrated control panel (9). The first gas supply pipeline (7) supplies hydrogen gas from a multistage accumulator (2) to a first filled tank (53) mounted on a first vehicle (51). The second gas supply pipeline (8) supplies hydrogen gas from the multistage accumulator (2) to a second filled tank (54) mounted on a second vehicle (52) different from the first vehicle (51). At the time of filling the hydrogen gas into both of the first filled tank (53) and the second filled tank (54) from the multistage accumulator (2), the integrated control panel (9) sets a pressure rise rate of the first filled tank (53) or a pressure rise rate of the second filled tank (54) to be lower than a reference pressure rise rate in accordance with a difference in pressure between the first filled tank (53) and the second filled tank (54). |
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