HYDROGEN FLUORIDE GAS REMOVAL DEVICE AND METHOD FOR REMOVING HYDROGEN FLUORIDE GAS

A hydrogen fluoride gas removal device capable of continuously performing a removal treatment of removing hydrogen fluoride gas from a mixed gas containing the hydrogen fluoride gas for a long period of time without stopping the removal treatment is provided. The hydrogen fluoride gas removal device...

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Bibliographische Detailangaben
Hauptverfasser: FUKUCHI, Yohsuke, KANAUCHI, Riku, KOBAYASHI, Hiroshi
Format: Patent
Sprache:eng ; fre ; ger
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Beschreibung
Zusammenfassung:A hydrogen fluoride gas removal device capable of continuously performing a removal treatment of removing hydrogen fluoride gas from a mixed gas containing the hydrogen fluoride gas for a long period of time without stopping the removal treatment is provided. The hydrogen fluoride gas removal device is capable of removing hydrogen fluoride gas from a mixed gas containing the hydrogen fluoride gas and another type of gas. This hydrogen fluoride gas removal device has: a hydrogen fluoride gas removal treatment machine (10) that is configured to perform a treatment of removing hydrogen fluoride gas from the mixed gas by bringing the mixed gas into contact with a removal agent for removing the hydrogen fluoride gas from the mixed gas; a removal agent supply machine (20) that is configured to supply the removal agent to the hydrogen fluoride gas removal treatment machine (10); a removal agent recycling treatment machine (30) that is configured to perform a recycling treatment on the used removal agent to improve hydrogen fluoride gas removal performance of the removal agent; and a recycling-treated removal agent transport machine (40) that is configured to transport the recycling-treated removal agent to supply the removal agent to the removal agent supply machine (20).