MASK ASSEMBLY

A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the pattern...

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Bibliographische Detailangaben
Hauptverfasser:	LANSBERGEN, Robert, Gabriël, Maria, BOGAART, Erik, Willem, JANSSEN, Paul, BROUNS, Derk, Servatius, Gertruda, LOOPSTRA, Erik, Roelof, LEENDERS, Martinus, Hendrikus, Antonius, LIPSON, Matthew, VAN DEN HEIJKANT, Sander, VAN LOO, Jérôme, François, Sylvain, Virgile, VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien, DEKKERS, Jeroen, VAN DER MEULEN, Frits, BRUIJN, Marc, KRAMER, Ronald, Harm, Gunther, VAN DEN BOSCH, Gerrit, KAMALI, Mohammad, Reza, AZEREDO LIMA, Jorge, Manuel, KRUIZINGA, Matthias, BRULS, Richard, Joseph, LYONS, Joseph, Harry, VAN DER GRAAF, Sandra, JANSEN, Maarten, ROUX, Stephen
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.