MASK EXPOSURE METHOD, TRANSPARENT CONDUCTIVE METALLIZATION AND PIGMENT
The invention relates to a mask exposure method comprising the following steps: -the providing of a carrier substrate; the print application of a radiation-crosslinkable washable dye layer to the full area of the carrier substrate; -the exposure of the radiation-crosslinkable washable dye layer in d...
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Format: | Patent |
Sprache: | eng ; fre ; ger |
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Zusammenfassung: | The invention relates to a mask exposure method comprising the following steps: -the providing of a carrier substrate; the print application of a radiation-crosslinkable washable dye layer to the full area of the carrier substrate; -the exposure of the radiation-crosslinkable washable dye layer in defined regions to radiation by means of a radiation mask, such that the washable dye is cured in the defined regions; -the applying of a metallization over the full area; -the removing of the non-radiation-exposed washable dye outside the defined regions together with the metal present thereon with the aid of a solvent, such that the resultant carrier substrate has cured washable dye with metal applied thereto only in defined regions. |
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