QUARTZ GLASS BODY

A method for producing a quartz glass body, the method comprising: forming a slurry of a powder of silicon dioxide particles and a liquid; treating the slurry with ultrasound in order to deagglomerate agglomerates formed in the slurry, and conducting the slurry through a multistage filter device to...

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Bibliographische Detailangaben
Hauptverfasser: SÖHN, Matthias, KAYSER, Thomas, WHIPPEY, Nigel R, GÖBEL, Marcus Constantin, WEISENSEEL, Bastian, WITTRIN, Mirko, GROMANN, Boris, WISSEL-STOLL, Kathrin, SCHEICH, Gerrit, WILDE, Markus
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:A method for producing a quartz glass body, the method comprising: forming a slurry of a powder of silicon dioxide particles and a liquid; treating the slurry with ultrasound in order to deagglomerate agglomerates formed in the slurry, and conducting the slurry through a multistage filter device to obtain a silicon dioxide suspension; forming a silicon dioxide granulate from the silicon dioxide suspension by means of granulation; forming a glass melt in a furnace and forming a quartz glass body from the glass melt; wherein the furnace has a gas outlet from which a gas is removed, wherein the dew point of the gas directly after removal is less than 0°C; wherein the multistage filter device comprises at least three filter stages, each of which contains at least one filter; wherein the first filter stage has a filter fineness of 5 µm, the second filter stage has a filter fineness of 0.5 to 5 µm and the third filter stage has a filter fineness of at most 1 µm; wherein the efficiency is at least 50% for the first filter stage, at least 95% for the second filter stage and 99.5% for the third filter stage.