METHODS, DEVICES, AND APPARATUS FOR WASHING SAMPLES ON ARRAY PLATES

METHODS, DEVICES, AND APPARATUS FOR WASHING SAMPLES ON ARRAY PLATES

A method for washing a sample comprises the step of obtaining an array plate that includes an array of hydrophilic areas surrounded by one or more hydrophobic areas. A respective solution containing a sample is located on a respective hydrophilic area of the array of hydrophilic areas. The respectiv...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Cheng, Kong Leong, Kim, Namyong
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
BASIC ELECTRIC ELEMENTS
CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
SEMICONDUCTOR DEVICES
TRANSPORTING
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Beschreibung
Zusammenfassung:A method for washing a sample comprises the step of obtaining an array plate that includes an array of hydrophilic areas surrounded by one or more hydrophobic areas. A respective solution containing a sample is located on a respective hydrophilic area of the array of hydrophilic areas. The respective hydrophilic area includes one or more indentations from a respective surrounding hydrophobic area of the one or more hydrophobic areas. The respective hydrophilic area includes a first indented surface that is offset from a reference surface defined by the respective surrounding hydrophobic area. An aspirator nozzle is placed above the respective hydrophilic area at least 100 µm from the first indented surface. The solution is aspirated with the aspirator nozzle while the aspirator nozzle is located at least 100 µm from the first indented surface.