HYDROGEL STRUCTURE

A hydrogel structure (10) includes: a continuous phase (11) of a first hydrogel; and a dispersion phase (12) of a second hydrogel, the dispersion phase being dispersed in the continuous phase (11). A ratio of a local minimum value of a load after break to a breaking load (a local minimum value of a...

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Bibliographische Detailangaben
Hauptverfasser:	HAMADA Saki, TOYOTA Shohei
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMISTRY COMPOSITIONS BASED THEREON GENERAL PROCESSES OF COMPOUNDING HUMAN NECESSITIES HYGIENE MEDICAL OR VETERINARY SCIENCE METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PREPARATIONS FOR MEDICAL, DENTAL, OR TOILET PURPOSES SPECIFIC USE OF COSMETICS OR SIMILAR TOILETPREPARATIONS THEIR PREPARATION OR CHEMICAL WORKING-UP THEIR RELEVANT APPARATUS TRANSPORTING WORKING-UP
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Beschreibung
Zusammenfassung:	A hydrogel structure (10) includes: a continuous phase (11) of a first hydrogel; and a dispersion phase (12) of a second hydrogel, the dispersion phase being dispersed in the continuous phase (11). A ratio of a local minimum value of a load after break to a breaking load (a local minimum value of a load after break/a breaking load) of the hydrogel structure (10) is 0.1 or more.