METHOD FOR PROCESSING GALLIUM OXIDE SUBSTRATE
Provided is a practical method for processing a gallium oxide substrate that enables the gallium oxide substrate to be cut vertically and horizontally in a lattice shape. Mechanical scribing processing in which a cut groove is engraved on a main plane by a scribing tool along a planned cutting line...
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Format: | Patent |
Sprache: | eng ; fre ; ger |
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Zusammenfassung: | Provided is a practical method for processing a gallium oxide substrate that enables the gallium oxide substrate to be cut vertically and horizontally in a lattice shape. Mechanical scribing processing in which a cut groove is engraved on a main plane by a scribing tool along a planned cutting line parallel to an X direction, which is defined as a direction parallel to an intersection line between the main plane and a plane (100), is performed using a gallium oxide substrate of which the main plane is the plane (001), laser scribing processing to be altered by scanning with a laser beam along a planned cutting line parallel to the Y direction is performed, and cutting is performed by break along planned cutting lines in the X direction and the Y direction after the mechanical scribing processing and after the laser scribing processing. |
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