PIXEL MATRIX SENSOR AND METHOD OF MANUFACTURING THE SAME
The invention relates to a method of preparing a pixel matrix sensor with a backside-illuminated geometry. After depositing (S12) a sensor layer on a second side of the substrate, a substrate spacer is prepared (S14), including removing completely the substrate in the central area from the second si...
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Format: | Patent |
Sprache: | eng ; fre ; ger |
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Zusammenfassung: | The invention relates to a method of preparing a pixel matrix sensor with a backside-illuminated geometry. After depositing (S12) a sensor layer on a second side of the substrate, a substrate spacer is prepared (S14), including removing completely the substrate in the central area from the second side of the substrate to create a gap in a central area above a photoactive region of the sensor layer and leaving the substrate spacer on the second side of the substrate and outside of the central area. An optical filter is then attached (S15) to the substrate spacer. The substrate spacer serves as a mechanical spacer for mounting the optical filter and facilitates maintaining the spatial homogeneity of the width of a gap between the optical filter and the sensor layer, without requiring additional holder structures for mounting the optical filter. |
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