FILM-FORMING COMPOSITION FOR SKIN

Provided is a film-forming composition for skin excellent in scratch resistance. The present invention relates to a film-forming composition for skin, including the following components (A) and (B): (A) a silicone-based film-forming agent; and (B) a fiber having an average fiber diameter of 0.1 µm o...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: ITO, Motoaki, ISHIDA, Kaori
Format: Patent
Sprache:eng ; fre ; ger
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Beschreibung
Zusammenfassung:Provided is a film-forming composition for skin excellent in scratch resistance. The present invention relates to a film-forming composition for skin, including the following components (A) and (B): (A) a silicone-based film-forming agent; and (B) a fiber having an average fiber diameter of 0.1 µm or more and 7 µm or less in an amount of 0.05 mass% or more and 2 mass% or less relative to the whole film-forming composition, in which the mass ratio of the component (B) to the component (A), (B/A), is 0.05 or more and 1 or less.