MECHANICAL ALIGNMENT OF X-RAY SOURCES
An X-ray source (100), comprising: an electron source (110) adapted to provide an electron beam (e) directed towards a liquid jet target such that the electron beam interacts with the liquid jet target to generate X-ray radiation (X); a deflector arranged for scanning the electron beam over the liqu...
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Format: | Patent |
Sprache: | eng ; fre ; ger |
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Zusammenfassung: | An X-ray source (100), comprising: an electron source (110) adapted to provide an electron beam (e) directed towards a liquid jet target such that the electron beam interacts with the liquid jet target to generate X-ray radiation (X); a deflector arranged for scanning the electron beam over the liquid jet target; a target orientation sensor (270, 272) configured to generate a signal indicating an orientation of the liquid jet target relative to the electron beam by monitoring a quantity indicative of an interaction between the electron beam and the liquid jet target as a function of electron beam position; and a target adjustment means (280) configured to adjust the orientation of the liquid jet target relative to the electron beam. A corresponding method for aligning an X-ray source is also disclosed. |
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