A METHOD OF PERFORMING METROLOGY ON A MICROFABRICATION PATTERN

There is provided a method of performing metrology on a microfabrication pattern, the method comprising:generating, by a SEM, a first set of frames of a first region of the pattern, a second set of frames of a second region of the pattern, and a third set of frames of a third region of the pattern,...

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Bibliographische Detailangaben
Hauptverfasser: Lorusso, Gian Francesco, Severi, Joren, De Simone, Danilo
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:There is provided a method of performing metrology on a microfabrication pattern, the method comprising:generating, by a SEM, a first set of frames of a first region of the pattern, a second set of frames of a second region of the pattern, and a third set of frames of a third region of the pattern, wherein a number of frames of the first, second and third sets of frames are different;for each of the first, second and third set of frames, by a computing device:estimating feature data representing edge positions, linewidths or centerline positions of one or more features of the region of the pattern of the set of frames, andcomputing a preliminary estimate of a roughness parameter from the feature data, wherein the roughness parameter is indicative of a line edge roughness, a linewidth roughness, or a pattern placement roughness of the one or more features;wherein the method further comprises, by the computing device:fitting a model equation to the preliminary estimates of the roughness parameter and a model parameter dependent on the number of frames of the set of frames, the model equation relating the model parameter to the roughness parameter; andcomputing a final estimate of the roughness parameter as an asymptotic value of the fitted model equation.