CHEMICAL REACTION METHOD, CHEMICAL REACTION APPARATUS AND PRODUCTION METHOD

In a chemical reaction device (100) that improves an yield of a product and that causes a reaction, progress of which in a gaseous phase is restricted by a chemical equilibrium between a source material and the product, a cumulative value is not less than 500 mm2, the cumulative value being obtained...

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Bibliographische Detailangaben
Hauptverfasser:	SUZUTA, Tetsuya, MATSUDA, Masato, SATO, Yuichi, NAKASUJI, Takehiro
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS THEREFOR CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMISTRY GENERAL METHODS OF ORGANIC CHEMISTRY METALLURGY ORGANIC CHEMISTRY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL THEIR RELEVANT APPARATUS TRANSPORTING
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Beschreibung
Zusammenfassung:	In a chemical reaction device (100) that improves an yield of a product and that causes a reaction, progress of which in a gaseous phase is restricted by a chemical equilibrium between a source material and the product, a cumulative value is not less than 500 mm2, the cumulative value being obtained by cumulatively adding, from one end to the other end of a cooling surface (53) in a height direction, products of (i) a distance L between (a) a surface of a catalyst layer (3) which surface is in contact with a transmission wall (40) and (b) an outer surface of the cooling surface (53) and (ii) a height H of the catalyst layer (3) corresponding to the outer surface having the distance L.