POLYIMIDE-BASED RESIN FILM, SUBSTRATE FOR DISPLAY DEVICE USING SAME, AND OPTICAL DEVICE
The present disclosure relates to a polyimide-based resin film wherein a thermal hysteresis gap at a temperature of 50°C or more and 150°C or less is 100 µm or more and 500 µm or less, and a substrate for display device, and an optical device using the same.
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Format: | Patent |
Sprache: | eng ; fre ; ger |
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Zusammenfassung: | The present disclosure relates to a polyimide-based resin film wherein a thermal hysteresis gap at a temperature of 50°C or more and 150°C or less is 100 µm or more and 500 µm or less, and a substrate for display device, and an optical device using the same. |
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