PROJECTOR PATTERN
A detector (110) for determining a position of at least one object (112) is disclosed. The detector (110) comprises:- at least one projector (122) for illuminating the object (112) with at least one illumination pattern (124), wherein the illumination pattern (124) comprises a plurality of illuminat...
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Format: | Patent |
Sprache: | eng ; fre ; ger |
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Zusammenfassung: | A detector (110) for determining a position of at least one object (112) is disclosed. The detector (110) comprises:- at least one projector (122) for illuminating the object (112) with at least one illumination pattern (124), wherein the illumination pattern (124) comprises a plurality of illumination features (125), wherein the illumination features (125) are spatially modulated;- at least one sensor element (114) having a matrix (116) of optical sensors (118), the optical sensors (118) each having a light-sensitive area (120), wherein each optical sensor (118) is designed to generate at least one sensor signal in response to an illumination of its respective light-sensitive area (120) by a reflection light beam propagating from the object to the detector (110), wherein the sensor element (114) is configured to determine at least one reflection image (142);- at least one evaluation device (144), wherein the evaluation device (144) is configured to select at least one reflection feature of the reflection image (142), wherein the evaluation device (144) is configured for determining at least one longitudinal coordinate z of the selected reflection feature of the reflection image (142) by using a depth-from-photon-ratio technique by evaluating a combined signal Q from the sensor signals,wherein the illumination features (125) are arranged in a periodic pattern equidistant in rows,wherein each of the rows of illumination features (125) have an offset, wherein the offset of neighboring rows differ. |
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