BLACK QUARTZ GLASS AND METHOD FOR MANUFACTURING SAME

The present invention relates to a black quartz glass comprising Si of 0.5 to 10 mass%, SiO of 0.1 to 5 mass% and SiO2 of the residue, wherein the SCE reflectance at a wavelength of 350 nm to 750 nm is 10% or less; a method for producing the black quartz glass, comprising: pressure-molding a powder...

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Hauptverfasser: SAKURAI, Manabu, KUNIYOSHI, Minoru
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:The present invention relates to a black quartz glass comprising Si of 0.5 to 10 mass%, SiO of 0.1 to 5 mass% and SiO2 of the residue, wherein the SCE reflectance at a wavelength of 350 nm to 750 nm is 10% or less; a method for producing the black quartz glass, comprising: pressure-molding a powder obtained by mixing and consolidating (1) fumed silica, or (2) a mixture powder of fumed silica and a synthetic silica powder, or (3) a mixture powder of fumed silica, spherical silica and a synthetic silica powder, with a Si powder of 0.5 to 10 mass% and a SiO powder of 0.1 to 5 mass%, and heating and sintering the pressure-molded product in the atmosphere; and a product comprising a black quartz glass member made of the black quartz glass. The present invention allows to provide a black quartz glass which has an excellent light-shielding property, has no risk of causing contamination in a step of using it, has sufficient color uniformity when the size is enlarged, and is capable of producing a large ingot, and to provide a method for producing the black quartz glass with excellent productivity even in the large ingot, and to provide a black quartz glass product made of the black quartz glass.