PATTERN FORMING APPARATUS FOR BASE MATERIAL, PATTERN FORMING METHOD, BASE MATERIAL, AND CONTAINER

A pattern forming apparatus for a base material includes a holding unit and a pattern forming unit. The holding unit is configured to hold a base material on which one of a protrusion shape portion and a recess shape portion is formed. The pattern forming unit is configured to form a pattern on the...

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Hauptverfasser: HIRAYAMA, Rie, FUJITA, Kazuhiro, SAKAI, Shoichiro, AKATSU, Kazuhiro
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:A pattern forming apparatus for a base material includes a holding unit and a pattern forming unit. The holding unit is configured to hold a base material on which one of a protrusion shape portion and a recess shape portion is formed. The pattern forming unit is configured to form a pattern on the base material. The pattern is formed on at least one of the protrusion shape portion, the recess shape portion, a periphery of the recess shape portion, a periphery of the protrusion shape portion, a portion along the protrusion shape portion, and a portion along the recess shape portion.