WORKPIECE HOLDER, SYSTEM AND OPERATING METHOD FOR PECVD

A workpiece holder for a plasma-enhanced chemical vapor deposition system is configured to produce a plasma from a process gas surrounding the workpiece holder. The workpiece holder is also configured to heat the surroundings of the workpiece holder to a process temperature provided for the vapor de...

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Bibliographische Detailangaben
Hauptverfasser:	FUCHS, Jens-Uwe, TRÖLLER, Mirko, LEICHTLE, Roland, REIZE, Ralf
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A workpiece holder for a plasma-enhanced chemical vapor deposition system is configured to produce a plasma from a process gas surrounding the workpiece holder. The workpiece holder is also configured to heat the surroundings of the workpiece holder to a process temperature provided for the vapor deposition. A chemical vapor deposition system and an operating method for the system are also provided.