ELECTROSTATIC CHUCK WITH EMBOSSMENTS THAT COMPRISE DIAMOND-LIKE CARBON AND DEPOSITED SILICON-BASED MATERIAL, AND RELATED METHODS
Described are electrostatic chucks that are useful to support a workpiece during a step of processing the workpiece, the electrostatic chuck including embossments that are made of multiple deposited layers, the layers including diamond-like carbon layers and layers that contain silicon-based materia...
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Format: | Patent |
Sprache: | eng ; fre ; ger |
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Zusammenfassung: | Described are electrostatic chucks that are useful to support a workpiece during a step of processing the workpiece, the electrostatic chuck including embossments that are made of multiple deposited layers, the layers including diamond-like carbon layers and layers that contain silicon-based materials such as silicon carbide layers. |
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