ELECTROSTATIC CHUCK WITH EMBOSSMENTS THAT COMPRISE DIAMOND-LIKE CARBON AND DEPOSITED SILICON-BASED MATERIAL, AND RELATED METHODS

Described are electrostatic chucks that are useful to support a workpiece during a step of processing the workpiece, the electrostatic chuck including embossments that are made of multiple deposited layers, the layers including diamond-like carbon layers and layers that contain silicon-based materia...

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Bibliographische Detailangaben
Hauptverfasser: LIU, Yan, CHAN, Chun Wang, DONNELL, Steven, RYBCZYNSKI, Jakub, MINSKY, Caleb
Format: Patent
Sprache:eng ; fre ; ger
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Beschreibung
Zusammenfassung:Described are electrostatic chucks that are useful to support a workpiece during a step of processing the workpiece, the electrostatic chuck including embossments that are made of multiple deposited layers, the layers including diamond-like carbon layers and layers that contain silicon-based materials such as silicon carbide layers.