ADDITIVE CHEMICAL VAPOR DEPOSITION METHODS AND SYSTEMS

A system for additive chemical vapor deposition (CVD) and (CVD) methods for producing free-standing 3D metal deposits with a controlled crystal size, the method comprising a) supplying a CVD mixture containing at least one CVD precursor into a deposition chamber having a rotatable mandrel with a dep...

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Bibliographische Detailangaben
1. Verfasser:	TEREKHOV, Dmitri S
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	ADDITIVE MANUFACTURING TECHNOLOGY ADDITIVE MANUFACTURING, i.e. MANUFACTURING OFTHREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVEAGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING,STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PERFORMING OPERATIONS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING
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Beschreibung
Zusammenfassung:	A system for additive chemical vapor deposition (CVD) and (CVD) methods for producing free-standing 3D metal deposits with a controlled crystal size, the method comprising a) supplying a CVD mixture containing at least one CVD precursor into a deposition chamber having a rotatable mandrel with a deposition surface or a deposition table with a deposition surface; b) generating a radiation pattern in at least two programmable radiation modules, each programmable radiation module containing an array of individually addressable radiation transmitting and/or radiation emitting elements; and c) irradiating the deposition surface with a first radiation pattern from a first radiation module and a second radiation pattern from a second radiation module, wherein the first radiation module irradiates the deposition surface in a first direction and the second radiation module irradiates the deposition surface in a second direction, and depositing a material from the CVD mixture on the deposition surface.