OPTIMIZED CONTACT STRUCTURE AND METHODS OF ITS MANUFACTURE
Disclosed are optimized contract structures and fabrication techniques thereof. At least one aspect includes a semiconductor die. The semiconductor die includes a substrate and a contact disposed within the substrate. The contact includes a first portion with a first vertical cross-section having a...
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Format: | Patent |
Sprache: | eng ; fre ; ger |
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Zusammenfassung: | Disclosed are optimized contract structures and fabrication techniques thereof. At least one aspect includes a semiconductor die. The semiconductor die includes a substrate and a contact disposed within the substrate. The contact includes a first portion with a first vertical cross-section having a first cross-sectional area. The first vertical cross-section has a first width and a first height. The contact also includes a second portion with a second vertical cross-section having a second cross-sectional area less than the first cross-sectional area. The second vertical cross-section includes a lower portion having the first width and a second height less than the first height, and an upper portion disposed above the lower portion and having a second width less than the first width and having a third height less than the first height. |
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