THE FORMATION OF CATALYST PT NANODOTS BY PULSED/SEQUENTIAL CVD OR ATOMIC LAYER DEPOSITION

The disclosure describes a method of depositing a plurality Ft metal containing nanodots on a catalyst carbon support structure by forming a vapor of Pt(PF3)4, exposing a surface of the catalyst support to the vapor of Pt(PF3)4, purging the surface of the catalyst support with a purge gas to remove...

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Bibliographische Detailangaben
Hauptverfasser:	DEMARLY, Quentin, DUSSARRRAT, Christian, TERAMOTO, Takashi, BLASCO, Nicolas, ONO, Takashi
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The disclosure describes a method of depositing a plurality Ft metal containing nanodots on a catalyst carbon support structure by forming a vapor of Pt(PF3)4, exposing a surface of the catalyst support to the vapor of Pt(PF3)4, purging the surface of the catalyst support with a purge gas to remove the vapor of Pt(PF3)4, exposing the surface of the catalyst support to a second reactant in gaseous form, purging the surface of the catalyst support with a purge gas to remove the second reactant, and repeating these steps to form a plurality of the Pt metal containing nanodots.