WASHING-OUT DEVICE AND WASHING-OUT METHOD

Provided are a washout processor and a washing method in which a device configuration is small and processing such as development can be stably performed on a flexographic printing plate precursor. There is provided a washout processor that performs development using a washing solution while transpo...

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Bibliographische Detailangaben
Hauptverfasser:	SONE Nobuyuki, OSHIMA Atsushi, MOGI Fumio, HASHIGAYA Manabu
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	Provided are a washout processor and a washing method in which a device configuration is small and processing such as development can be stably performed on a flexographic printing plate precursor. There is provided a washout processor that performs development using a washing solution while transporting an imagewise exposed flexographic printing plate precursor, the washout processor having a leader that fixes both of a leading end and a trailing end of the flexographic printing plate precursor and a tension applying unit that applies tension to the flexographic printing plate precursor.