COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND AND POLYMER FOR FORMING ORGANIC FILM

The present invention is a composition for forming an organic film, containing: a material for forming an organic film shown by the following general formula (I) and/or general formula (II); and an organic solvent, where R1 and R4 each represent a hydrogen atom, an allyl group, or a propargyl group,...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Kobayashi, Naoki, Kori, Daisuke
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY ELECTROGRAPHY HETEROCYCLIC COMPOUNDS HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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