A SIGNAL PARAMETER DETERMINATION METHOD, A HETERODYNE INTERFEROMETER SYSTEM, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD

The invention provides a a method to determine one or more signal parameters of each signal of interest in a plurality of signals of interest received at a single detector of a heterodyne interferometer, said method comprising the following steps: a. for each signal or interest, calculating a cleane...

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Bibliographische Detailangaben
Hauptverfasser:	IKKINK, Teunis, Jan, JANSEN, Maarten, Jozef
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TESTING
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Beschreibung
Zusammenfassung:	The invention provides a a method to determine one or more signal parameters of each signal of interest in a plurality of signals of interest received at a single detector of a heterodyne interferometer, said method comprising the following steps: a. for each signal or interest, calculating a cleaned-up signal by estimating signal contributions of the other signals of interest and subtracting these estimated signal contributions from the plurality of signals of interest; and b. for each signal of interest, determining one or more signal parameters from the respective cleaned-up signal.